The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2019
Filed:
Nov. 09, 2017
Merck Sharp & Dohme. Corp., Rahway, NJ (US);
Msd R&d (China) Co., Ltd., Pudong District, Shanghai, CN;
Merck Sharp & Dohme Limited, Hoddesdon, Hertfordshire, GB;
Hongming Li, Westfield, NJ (US);
Jingjun Yin, Greenbrook, NJ (US);
Kevin M. Belyk, Metuchen, NJ (US);
Kevin R. Campos, Berkeley Heights, NJ (US);
Qinghao Chen, Edison, NJ (US);
Alan M. Hyde, Metuchen, NJ (US);
Tetsuji Itoh, Somerset, NJ (US);
Artis Klapars, Edison, NJ (US);
Matthew Thomas Tudge, Wayne, PA (US);
Edward Cleator, Cambridge, GB;
Aaron M. Dumas, Hertford, GB;
Louis-Charles Campeau, Morris Plains, NJ (US);
Yonggang Chen, Westfield, NJ (US);
Ji Qi, Shanghai, CN;
Wensong Xiao, Beijing, CN;
MSD R&D CN CO., LTD, Shanghai, CN;
MERCK SHARP & DOHME CORP., Rahway, NJ (US);
MERCK SHARP & DOHME LIMITED, Hoddesdon, Hertfordshire, GB;
Abstract
The present invention is directed to a process for making Tetracyclic Heterocycle Compounds of Formula (I): and pharmaceutically acceptable salts thereof, wherein X, X, R, Rand Rare defined above herein. The present invention is also directed to compounds that may be useful as synthetic intermediates in the process of the invention.