The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
Mar. 18, 2015
Bae Systems Plc, London, GB;
Yang Hao, London, GB;
BAE Systems plc, London, GB;
Abstract
A lens design method is disclosed for designing a lens to reshape an actual far-field radiation pattern of a radiation source, such as a spiral antenna, to a preferred far-field radiation pattern. The method comprises:—determining a preferred far-field radiation pattern of the radiation source;—deriving a corresponding near-field radiation pattern from the preferred far-field radiation pattern;—determining an actual near-field pattern of the radiation source;—mapping an electric field and a magnetic field of the actual near-field radiation pattern to the derived near-field radiation pattern using a transfer relationship, the transfer relationship comprising material parameters which characterize the lens; and,—determining the material parameters.