The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2019

Filed:

Jan. 09, 2018
Applicant:

Infineon Technologies Austria Ag, Villach, AT;

Inventors:

Jens Peter Konrath, Villach, AT;

Ronny Kern, Finkenstein, AT;

Stefan Krivec, Arnoldstein, AT;

Ulrich Schmid, Vienna, AT;

Laura Stoeber, Vienna, AT;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/872 (2006.01); H01L 29/16 (2006.01); H01L 21/04 (2006.01); H01L 29/66 (2006.01); H01L 29/868 (2006.01); H01L 29/06 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 29/872 (2013.01); H01L 21/0495 (2013.01); H01L 29/0619 (2013.01); H01L 29/1608 (2013.01); H01L 29/6606 (2013.01); H01L 29/868 (2013.01); H01L 29/1602 (2013.01); H01L 29/2003 (2013.01);
Abstract

An embodiment of a method of manufacturing a semiconductor device includes providing a semiconductor material that comprises SiC and forming an electrically conductive contact layer on the semiconductor material. A non-ohmic contact is formed between the semiconductor material and the electrically conductive contact layer. The electrically conductive contact layer comprises a metal nitride with a nitrogen content between 10 to 50 atomic %. Additional embodiments of manufacturing a semiconductor device are described.


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