The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2019

Filed:

Aug. 18, 2016
Applicant:

Csmc Technologies Fab2 Co., Ltd., Wuxi New District, Jiangsu, CN;

Inventors:

Shukun Qi, Jiangsu, CN;

Guipeng Sun, Jiangsu, CN;

Assignee:

CSMC TECHNOLOGIES FAB2 CO., LTD., Wuxi New District, Jiang, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/76 (2006.01); H01L 29/94 (2006.01); H01L 31/062 (2012.01); H01L 31/113 (2006.01); H01L 31/119 (2006.01); H01L 29/78 (2006.01); H01L 29/08 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7816 (2013.01); H01L 29/063 (2013.01); H01L 29/0882 (2013.01); H01L 29/7833 (2013.01); H01L 29/0692 (2013.01);
Abstract

A laterally diffused metal-oxide semiconductor field-effect transistor, comprising a substrate, a first conductivity type well region, a second conductivity type well region, a drain electrode in the first conductivity type well region, a source electrode and a body region in the second conductivity type well region, and a gate electrode arranged across surfaces of the first conductivity type well region and the second conductivity type well region, and also comprising a floating layer ring arranged on the top of the first conductivity type well region and located between the gate electrode and the drain electrode and a plurality of groove polysilicon electrodes running through the floating layer ring and stretching into the first conductivity type well region.


Find Patent Forward Citations

Loading…