The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
Oct. 30, 2017
Applicant:
Renesas Electronics Corporation, Koutou-ku, Tokyo, JP;
Inventor:
Hiroyuki Momono, Tokyo, JP;
Assignee:
Renesas Electronics Corporation, Koutou-ku, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/00 (2006.01); G06F 17/50 (2006.01); H01L 27/146 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 27/14685 (2013.01); G06F 17/5072 (2013.01); H01L 22/20 (2013.01); H01L 22/30 (2013.01); H01L 27/14603 (2013.01); H01L 27/14605 (2013.01); H01L 27/14623 (2013.01); H01L 27/14643 (2013.01); H01L 27/14683 (2013.01); G06F 2217/12 (2013.01); Y10T 428/24802 (2015.01);
Abstract
A mask includes a substrate, an effective pixel formation region and a reference pattern formation region. A pixel pattern for forming a pixel component that constitutes a pixel is arranged in the effective pixel formation region. A reference pattern for indicating a reference position where pixel pattern should be arranged in the effective pixel formation region is arranged in the reference pattern formation region. Pixel pattern is arranged to be displaced from the reference position toward a center side of the effective pixel formation region.