The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
Sep. 27, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Edward Ng, San Jose, CA (US);
Jeffrey C. Hudgens, San Francisco, CA (US);
Ayan Majumdar, San Jose, CA (US);
Sushant S. Koshti, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); H01L 21/677 (2006.01); H01L 21/67 (2006.01); B65H 15/00 (2006.01); B65H 43/04 (2006.01); B08B 1/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68707 (2013.01); B65H 15/00 (2013.01); B65H 43/04 (2013.01); H01L 21/67051 (2013.01); H01L 21/67225 (2013.01); H01L 21/67778 (2013.01); B08B 1/00 (2013.01); B65H 2301/333 (2013.01); B65H 2404/651 (2013.01); B65H 2405/50 (2013.01); B65H 2515/716 (2013.01); B65H 2553/20 (2013.01);
Abstract
In some embodiments, methods and systems are provided for improved handling of lithography masks including loading a mask via a first load port from a first carrier; inverting the mask using a first contact pad; cleaning the mask; inverting the mask using a second contact pad; and unloading the mask via a second load port into a second carrier. Numerous other aspects are provided.