The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
Mar. 01, 2017
Applicant:
Infineon Technologies Ag, Neubiberg, DE;
Inventors:
Ingo Muri, Villach, AT;
Alexander Binter, Villach, AT;
Bernhard Goller, Villach, AT;
Christian Grindling, Klagenfurt, AT;
Assignee:
Infineon Technologioes AG, Neubiberg, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); H01L 21/683 (2006.01); B23C 3/13 (2006.01); B23Q 3/08 (2006.01); H01L 21/67 (2006.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6838 (2013.01); B23C 3/13 (2013.01); B23Q 3/088 (2013.01); H01L 21/67092 (2013.01); H01L 21/6875 (2013.01); H01L 21/68757 (2013.01); H01L 21/304 (2013.01); Y10T 279/11 (2015.01); Y10T 409/30868 (2015.01); Y10T 409/303808 (2015.01);
Abstract
According to various embodiments, a workpiece planarization arrangement may include: a chuck including at least one portion configured to support one or more workpieces; and a planarization tool configured to planarize the at least one portion of the chuck and to planarize one or more workpieces on the at least one portion of the chuck; wherein the at least one portion of the chuck includes at least one of particles, pores and/or a polymer.