The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
May. 12, 2016
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Assignee:
FUJIFILM Corporation, Minato-Ku, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01); G03F 7/42 (2006.01); B08B 3/04 (2006.01); B08B 3/08 (2006.01); B08B 3/10 (2006.01); B08B 7/00 (2006.01); B08B 9/00 (2006.01); C11D 7/26 (2006.01); C11D 11/00 (2006.01); H01L 21/3105 (2006.01); C11D 3/00 (2006.01); C11D 3/37 (2006.01); H01L 21/8238 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02057 (2013.01); B08B 3/041 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); B08B 7/0035 (2013.01); B08B 9/00 (2013.01); C11D 3/0073 (2013.01); C11D 3/3719 (2013.01); C11D 3/3723 (2013.01); C11D 3/3773 (2013.01); C11D 3/3776 (2013.01); C11D 7/261 (2013.01); C11D 7/265 (2013.01); C11D 7/267 (2013.01); C11D 7/32 (2013.01); C11D 7/3209 (2013.01); C11D 7/3245 (2013.01); C11D 7/3263 (2013.01); C11D 7/3272 (2013.01); C11D 7/3281 (2013.01); C11D 11/0047 (2013.01); G03F 7/425 (2013.01); H01L 21/31058 (2013.01); H01L 21/31133 (2013.01); H01L 21/823814 (2013.01); H01L 21/823857 (2013.01);
Abstract
Provided is a semiconductor substrate treatment liquid which removes an organic material on the top of a semiconductor substrate from the semiconductor substrate having a Ge-containing layer that includes germanium (Ge) or cleans the surface thereof, and the treatment liquid includes a liquid chemical component which adjusts the pH of the treatment liquid to be in a range of 5 to 16 and an anticorrosive component which is used to prevent the Ge-containing layer.