The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
Apr. 09, 2015
Applicant:
Oral 28 Inc., Kanagawa, JP;
Inventors:
Assignee:
Oral 28 Inc., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A01C 1/00 (2006.01); H01J 37/32 (2006.01); B01J 19/08 (2006.01); C01B 33/12 (2006.01); A61C 5/77 (2017.01); H05H 1/24 (2006.01); H05H 1/42 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32366 (2013.01); A61C 5/77 (2017.02); B01J 19/08 (2013.01); B01J 19/088 (2013.01); C01B 33/12 (2013.01); H01J 37/3244 (2013.01); H01J 37/32807 (2013.01); H05H 1/2406 (2013.01); H05H 1/42 (2013.01); B01J 2219/0879 (2013.01); B01J 2219/0894 (2013.01); H01J 2237/332 (2013.01); H05H 2001/2456 (2013.01); H05H 2245/122 (2013.01); H05H 2245/125 (2013.01); H05H 2277/10 (2013.01);
Abstract
Provided are a plasma irradiation apparatus and plasma irradiation method capable of converting a silica precursor to a high quality silica film in a short time without thermal effects on the object being processed. This plasma irradiation apparatusis provided with a plasma-generating unitand an irradiation unitfor irradiating the plasma generated by the plasma-generating uniton an object to be processed, and is characterized in that irradiation unitcomprises a coating partcapable of coating a liquid on the object being processed.