The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
Jan. 19, 2017
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Woongkyu Son, Hwaseong-si, KR;
Sangkyo Lim, Yongin-si, KR;
Sunhee Shim, Suwon-si, KR;
MiJung Jeon, Hwaseong-si, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/62 (2017.01); G06T 7/00 (2017.01); G06T 5/00 (2006.01); G06T 5/50 (2006.01);
U.S. Cl.
CPC ...
G06T 7/62 (2017.01); G06T 5/003 (2013.01); G06T 5/50 (2013.01); G06T 7/001 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/10148 (2013.01); G06T 2207/20016 (2013.01); G06T 2207/20221 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A method of inspecting a sample includes performing a focusing operation on a target pattern of a sample. The focusing operation includes scanning the target pattern at different focusing levels to obtain a plurality of focus images. The method further includes using at least one of the plurality of the focus images as a target pattern image of the target pattern and then measuring a dimension of the target pattern based on the target pattern image.