The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2019

Filed:

Mar. 02, 2017
Applicant:

Toshiba Memory Corporation, Minato-ku, JP;

Inventor:

Chikaaki Kodama, Arakawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/36 (2012.01);
U.S. Cl.
CPC ...
G06F 17/5072 (2013.01); G03F 1/36 (2013.01);
Abstract

In an assist pattern arrangement method according to an embodiment, a plurality of patterns, in which an assist pattern is to be arranged, are extracted from a design pattern that is prepared in advance. Then, a resolution map of the extracted pattern is calculated. The resolution map includes a first pattern that increases a resolution of the pattern and a second pattern that decreases the resolution of the pattern. After the resolution map is calculated, a plurality of calculated resolution maps are added. Then, the assist pattern is arranged on the design pattern on the basis of the addition result.


Find Patent Forward Citations

Kodama, Chikaaki. (2019). Assist pattern arrangement method and recording medium (U.S. Patent No. 10198546). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10198546

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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