The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2019

Filed:

Nov. 22, 2016
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Beijing Boe Display Technology Co., Ltd., Beijing, CN;

Inventors:

Tonghua Yang, Beijing, CN;

Hongjiang Wu, Beijing, CN;

Min Li, Beijing, CN;

Jikai Zhang, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/32 (2006.01); G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0007 (2013.01); G02F 1/133516 (2013.01); G03F 7/32 (2013.01);
Abstract

A method for manufacturing a color photoresist pattern in a color filter is provided. The method includes applying a layer of negative color resist onto a substrate; exposing the layer of negative color resist through a mask; and developing the exposed layer of negative color resist with a developer composition which comprises 0.01 to 5.0 parts by weight of inorganic or organic acids, 0.01 to 5.0 parts by weight of surfactant, 0.1 to 10.0 parts by weight of water-soluble organic solvent, 85 to 99 parts by weight of water, and 0 to 2 parts by weight of additives, based on 100 parts by weight of the developer composition.


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