The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
Apr. 24, 2017
Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, Guangdong, CN;
Zhuming Deng, Guangdong, CN;
Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd, Shenzhen, Guangdong, CN;
Abstract
Disclosed is a manufacturing method of a color filter substrate, comprising: providing a first substrate, and the first substrate comprising pixel unit regions and a light blocking region located between the pixel unit regions, coating a photoresist material on the first substrate, and exposing the pixel unit regions to form monochromatic blocks, and partially exposing the light blocking region to form color blocks; coating a black photoresist material in the light blocking region, and the black photoresist material covering the color blocks; exposing the black photoresist material and the black photoresist material located in the light blocking region forming a black matrix and the black photoresist material covering the color blocks forming spacers. The black photoresist material, of which the color blocks are used to be the substrate, form spacers, and the black photoresist material in the rest part of the light blocking region forms a black matrix.