The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2019

Filed:

Oct. 28, 2014
Applicant:

Sharp Kabushiki Kaisha, Osaka-shi, JP;

Inventors:

Sho Ochi, Osaka, JP;

Yasushi Asaoka, Osaka, JP;

Tsuyoshi Maeda, Osaka, JP;

Toru Kanno, Osaka, JP;

Assignee:

SHARP KABUSHIKI KAISHA, Sakai, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); G02B 5/02 (2006.01); G03F 7/40 (2006.01); G02B 5/04 (2006.01); G02B 5/20 (2006.01); G02F 1/1335 (2006.01); B29L 11/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/0268 (2013.01); B29D 11/00798 (2013.01); G02B 5/0231 (2013.01); G02B 5/0278 (2013.01); G02B 5/045 (2013.01); G02B 5/201 (2013.01); G02F 1/133504 (2013.01); G03F 7/40 (2013.01); G03F 7/405 (2013.01); B29L 2011/00 (2013.01);
Abstract

A light-diffusing-member manufacturing method includes a step of forming a light diffusion portion on one surface side of a base, by developing an exposed negative photosensitive resin layer with an alkali developing solution, and a step of performing an acid treatment on the light diffusion portion with an acid solution, after removing the alkali developing solution which is adhered to the light diffusion portion and suspended matter in the alkali developing solution in the negative photosensitive resin layer, so as to lower an ionization degree of the negative photosensitive resin layer which is in an ionized state due to the alkali developing solution.


Find Patent Forward Citations

Loading…