The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2019

Filed:

May. 23, 2016
Applicant:

Shimadzu Corporation, Kyoto-shi, Kyoto, JP;

Inventors:

Akiko Imazu, Kyoto, JP;

Hideaki Izumi, Neyagawa, JP;

Assignee:

SHIMADZU CORPORATION, Kyoto-shi, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/06 (2006.01); G01N 27/62 (2006.01); H01J 49/00 (2006.01);
U.S. Cl.
CPC ...
G01N 27/622 (2013.01); G01N 27/62 (2013.01); H01J 49/0031 (2013.01); H01J 49/06 (2013.01);
Abstract

A gate electrode (A) used as a shutter gate includes a pair of conductive fixture members () made of metal and identical in size attached to the inside of a rectangular opening () of a ceramic base (), along with insulating fixture members () made of ceramic attached to the inner sides of the conductive fixture members. Two comb electrodes () as one pair have connecting portions () adhered to the conductive fixture members () as well as thin-wire electrodes whose distal ends are adhered to the insulating fixture members (). By setting length L of the opening () and width D of the conductive fixture members () to appropriate values according to the coefficient of thermal expansion of each of those members, the elongation of the electrodes which accompanies an increase in temperature can be balanced by the increase in the distance between the adhered positions of the electrodes to prevent the electrodes from being excessively taut or slack. Therefore, the drift region can be heated to a higher temperature than conventional levels to perform a high-accuracy, high-resolution analysis free from the influence of residual water vapor or similar particles.


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