The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2019

Filed:

May. 12, 2015
Applicant:

Rasirc, Inc., San Diego, CA (US);

Inventors:

Daniel Alvarez, Jr., Oceanside, CA (US);

Jeffrey J. Spiegelman, San Diego, CA (US);

Russell J. Holmes, San Diego, CA (US);

Edward Heinlein, San Diego, CA (US);

Zohreh Shamsi, San Diego, CA (US);

Christopher Ramos, Bonita, CA (US);

Alex Deptala, Spring Valley, CA (US);

James Hogan, Coronado, CA (US);

Assignee:

RASIRC, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61L 2/00 (2006.01); A61L 9/00 (2006.01); B01D 47/02 (2006.01); C12Q 1/6848 (2018.01); A61L 2/20 (2006.01); C12Q 1/6806 (2018.01); A61L 2/18 (2006.01);
U.S. Cl.
CPC ...
C12Q 1/6848 (2013.01); A61L 2/186 (2013.01); A61L 2/208 (2013.01); C12Q 1/6806 (2013.01); A61L 2202/24 (2013.01);
Abstract

Methods and delivery systems for providing a gas phase of a multi-component liquid source for delivery to a critical process application are provided. The methods include concentration of a component of the liquid source which is less volatile than water for delivery of a gas stream comprising the less volatile component to a critical process application. Critical process applications include decontamination and microelectronic processing applications.


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