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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10196340 B1

PDFFull Text
Date of Patent:
Feb. 05, 2019

Filed:

Jun. 21, 2017

Clean process for preparing chloroformyl-substituted benzene

Applicant:

Finings Co. Ltd., Huai'an, Jiangsu, CN;

Inventors:

Nongyue Wang, Shanghai, CN;

Xiongwei Qu, Shanghai, CN;

Guohua Li, Shanghai, CN;

Jianming Shao, Shanghai, CN;

Quanzhong Zhao, Shanghai, CN;

Guoqiang Wen, Shanghai, CN;

Assignee:

Finings Co. Ltd., Huai'an, Jiangsu, CN;

Attorneys:

Mei & Mark LLP

Manni Li

Primary Examiner:

Yevgeny Valenrod

Assistant Examiner:

Blaine G Doletski

Int. Cl.
CPC ...
C07C 51/64 (2006.01); C07C 63/70 (2006.01); C07C 63/10 (2006.01); C07C 63/30 (2006.01); C07C 63/307 (2006.01); C07C 63/34 (2006.01);
U.S. Cl.
CPC ...
C07C 51/64 (2013.01); C07C 63/10 (2013.01); C07C 63/30 (2013.01); C07C 63/307 (2013.01); C07C 63/70 (2013.01); C07C 63/34 (2013.01);
Abstract

Clean process for preparing a chloroformyl-substituted benzene by oxidation of a tail gas hydrogen chloride from a chlorination reaction and a chloroacylation reaction and recycling of the resulting oxidation product chlorine gas into the chlorination reaction. The present invention provides a clean process for preparing a polymer-grade chloroformyl-substituted benzene.

Find Patent Forward Citations

Wang, Nongyue. (2019). Clean process for preparing chloroformyl-substituted benzene (U.S. Patent No. 10196340). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10196340

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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