The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
May. 11, 2015
Lg Chem, Ltd., Seoul, KR;
Eunsu Jang, Daejeon, KR;
Jeong Kyu Kim, Daejeon, KR;
Yoo Seok Kim, Daejeon, KR;
JinHyoung Yoo, Daejeon, KR;
JungWoo Lee, Daejeon, KR;
LG CHEM, LTD., Seoul, KR;
Abstract
The present invention relates to a polysilicon production apparatus. The apparatus includes: a horizontal reaction tube positioned in an insulated tube and having an inlet port through which gaseous raw materials including silicon-containing reactant gases and a reducing gas are supplied, an outlet port through which residual gases exit, a reaction surface with which the gaseous raw materials come into contact, and a plurality of bottom openings through which molten polysilicon produced by the reactions of the gaseous raw materials is discharged; one or more internal structures placed in the horizontal reaction tube to provide additional reaction surfaces; and first heating means adapted to heat the reaction surface of the horizontal reaction tube. The present invention also relates to a method for the production of polysilicon using the apparatus.