The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
May. 09, 2016
Applicants:
Wan Soo Kim, Seogwipo-si, KR;
Jung Hee Han, Seoul, KR;
Byung Hee Hong, Suwon-si, KR;
Inventors:
Assignee:
Graphene Square, Inc., Seoul, KR;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/26 (2006.01); H01J 37/32 (2006.01); C23C 16/50 (2006.01); C01B 32/186 (2017.01); B32B 37/00 (2006.01); B32B 37/10 (2006.01);
U.S. Cl.
CPC ...
C01B 32/186 (2017.08); B32B 37/025 (2013.01); B32B 37/10 (2013.01); C23C 16/26 (2013.01);
Abstract
Disclosed is an apparatus and method of manufacturing a graphene film, wherein the apparatus includes a wrinkle flattening device configured to flatten wrinkles in a lamination structure including a base substrate and a graphene film laminated on the base substrate; and a first lamination apparatus configured to laminate a first substrate on the graphene film, wherein the wrinkle flattening device applies a vacuum to the base substrate when the wrinkle flattening device is in contact with the base substrate.