The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
Jan. 10, 2018
Nicole Maaß, Fürth, DE;
Andreas Maier, Erlangen, DE;
Tobias Würfl, Erlangen, DE;
Siemens Healthcare GmbH, Erlangen, DE;
Abstract
A method for reducing image artifacts caused, for example, by beam hardening includes acquiring at least two projections of a transirradiated object are acquired from different perspectives by an X-ray emitter and an X-ray detector defining a projection plane. A correction model that is linear in parameters and is valid for the at least two projections is determined. At least two epipolar lines corresponding to a common epipolar plane are identified in the projection planes of the at least two projections. The parameters of the correction model are determined by optimization, taking account of data terms that are independent of the parameters. The data terms quantify a consistency condition of the at least two projections that applies to the epipolar lines. Artifact-reduced image data is determined based on the determined parameters.