The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2019
Filed:
Oct. 23, 2015
Applicant:
Nanoguard Technologies, Llc, St. Louis, MO (US);
Inventors:
Kevin M. Keener, Attica, IN (US);
Mark A. Hochwalt, Chesterfield, MO (US);
Assignee:
Nanoguard Technologies, LLC, St. Louis, MO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A23B 9/22 (2006.01); A61L 2/14 (2006.01); A61L 2/20 (2006.01); A61L 9/22 (2006.01);
U.S. Cl.
CPC ...
A23B 9/22 (2013.01); A61L 2/14 (2013.01); A61L 2/20 (2013.01); A61L 2/202 (2013.01); A23V 2002/00 (2013.01); A61L 9/22 (2013.01); A61L 2202/25 (2013.01);
Abstract
A method of treating a product or surface with a reactive gas, comprises producing the reactive gas by forming a high-voltage cold plasma (HVCP) from a working gas; transporting the reactive gas at least 5 cm away from the HVCP; followed by contacting the product or surface with the reactive gas. The HVCP does not contact the product or surface.