The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2019

Filed:

Jun. 08, 2017
Applicant:

Fujitsu Limited, Kawasaki-shi, Kanagawa, JP;

Inventors:

Youichi Kamada, Yamato, JP;

Shirou Ozaki, Yamato, JP;

Assignee:

FUJITSU LIMITED, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/00 (2006.01); H01L 29/40 (2006.01); H01L 23/495 (2006.01); H01L 29/20 (2006.01); H01L 29/205 (2006.01); H01L 29/66 (2006.01); H01L 29/778 (2006.01); H02M 5/458 (2006.01); H03F 1/32 (2006.01); H03F 3/193 (2006.01); H03F 3/21 (2006.01); H01L 29/423 (2006.01); H01L 23/66 (2006.01); H03F 3/195 (2006.01); H02M 1/42 (2007.01); H02M 3/337 (2006.01);
U.S. Cl.
CPC ...
H01L 29/408 (2013.01); H01L 23/49562 (2013.01); H01L 23/66 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 29/402 (2013.01); H01L 29/42316 (2013.01); H01L 29/66462 (2013.01); H01L 29/7787 (2013.01); H02M 5/458 (2013.01); H03F 1/3241 (2013.01); H03F 1/3247 (2013.01); H03F 3/193 (2013.01); H03F 3/195 (2013.01); H03F 3/21 (2013.01); H02M 1/4225 (2013.01); H02M 3/337 (2013.01); H03F 2200/204 (2013.01); H03F 2200/451 (2013.01);
Abstract

A compound semiconductor device includes: a carrier transit layer; a carrier supply layer over the carrier transit layer; a source electrode and a drain electrode above the carrier supply layer; a gate electrode above the carrier supply layer between the source electrode and the drain electrode; and a first insulating film, a second insulating film, and a third insulating film above the carrier supply layer between the gate electrode and the drain electrode. The gate electrode includes a portion above the third insulating film, a first concentration of electron traps in the first insulating film is higher than a second concentration of electron traps in the second insulating film, and a third concentration of electron traps in the third insulating film is higher than the second concentration of the electron traps in the second insulating film.


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