The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2019

Filed:

Aug. 11, 2014
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Sushant S. Koshti, Sunnyvale, CA (US);

Dean C. Hruzek, Cedar Park, TX (US);

Ayan Majumdar, San Jose, CA (US);

John C. Menk, Round Rock, TX (US);

Helder T. Lee, San Jose, CA (US);

Sangram Patil, Sunnyvale, CA (US);

Sanjay Rajaram, Sunnyvale, CA (US);

Douglas Baumgarten, Round Rock, TX (US);

Nir Merry, Mountain View, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67772 (2013.01); H01L 21/67207 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01);
Abstract

Electronic device processing systems including environmental control of the factory interface are described. One electronic device processing system has a factory interface having a factory interface chamber, a load lock apparatus coupled to the factory interface, one or more substrate carriers coupled to the factory interface, and an environmental control system coupled to the factory interface and operational to monitor or control one of: relative humidity, temperature, an amount of oxygen, or an amount of inert gas within the factory interface chamber. In another aspect, purge of a carrier purge chamber within the factory interface chamber is provided. Methods for processing substrates are described, as are numerous other aspects.


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