The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2019

Filed:

Jun. 02, 2014
Applicant:

Nec Corporation, Tokyo, JP;

Inventors:

Wataru Hattori, Tokyo, JP;

Naoki Kobayashi, Tokyo, JP;

Hiroshi Fukuda, Tokyo, JP;

Yusuke Takahashi, Tokyo, JP;

Ryo Kawai, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04Q 5/22 (2006.01); G06K 7/10 (2006.01); G06Q 10/06 (2012.01); G06Q 10/08 (2012.01); G08B 13/24 (2006.01);
U.S. Cl.
CPC ...
G06K 7/10366 (2013.01); G06K 7/10445 (2013.01); G06Q 10/06 (2013.01); G06Q 10/087 (2013.01); G08B 13/2462 (2013.01);
Abstract

It is impossible to individually identify management target articles in a conventional article management system. An article management system according to the present invention includes a reader antenna that transmits and receives a radio signal; a plurality of tag sheets each including an RF tag and placed on the reader antenna; an RFID reader that reads tag information unique to the RF tag via the reader antenna; and an identification mark attached to each of management target articles and arranged between the management target articles and each tag sheet. On a surface of the identification mark that faces the tag sheets, an identification pattern for identifying the identification mark is formed of a first pattern and a second pattern having a dielectric constant or conductivity lower than that of the first pattern.


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