The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2019
Filed:
Oct. 15, 2015
Institut National DE LA Sante ET DE LA Recherche Medicale (Inserm), Paris, FR;
Centre National DE LA Recherche Scientifique (Cnrs), Paris, FR;
Ecole Normale Superieure, Paric, FR;
Jean-Francois Leger, Sceaux, FR;
Laurnet Bourdieu, Pairs, FR;
Stephane Dieudonne, Chatenay Malabry, FR;
INSERM (Institute National de la Sante et de la Recherche Medicale), Paris, FR;
Centre National de la Recherche Scientifique (CNRS), Paris, FR;
Ecole Normale Superieure, Paris, FR;
Abstract
The present invention concerns a method for generating a pattern of light, this method comprising the following steps: a) emitting an input laser pulse (P), b) deflecting the input laser pulse (P) by a first deflector () to obtain a first laser pulse, c) deflecting the first laser pulse (P) by a second deflector () to obtain a second laser pulse (P), and d) focusing the pulse (P) by an optical element characterized in that: —the first deflector () shapes the first laser pulse (P) according to a first function, —the second deflector () shapes the second laser pulse (P) according to a second function, and—the first function f(x) and the second function g(y) are computed and/or optimized to obtain the desired pattern of light.