The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2019

Filed:

May. 04, 2016
Applicant:

Ecole Polytechnique Fédérale DE Lausanne (Epfl), Lausanne, CH;

Inventors:

Tobias Kippenberg, Lausanne, CH;

Martin Hubert Peter Pfeiffer, Lausanne, CH;

Arne Kordts, Crissier, CH;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01P 3/16 (2006.01); H01L 33/12 (2010.01); H01L 21/04 (2006.01); G02B 6/132 (2006.01); G02B 6/136 (2006.01); G02B 6/122 (2006.01); G01M 11/00 (2006.01); G02B 6/12 (2006.01);
U.S. Cl.
CPC ...
G02B 6/132 (2013.01); G01M 11/30 (2013.01); G02B 6/122 (2013.01); G02B 6/1228 (2013.01); G02B 6/136 (2013.01); H01L 21/042 (2013.01); H01L 21/0475 (2013.01); H01L 33/12 (2013.01); H01P 3/16 (2013.01); G02B 2006/12038 (2013.01);
Abstract

A waveguide fabrication method including the steps of providing a substrate including at least one waveguide recess structure and a stress release recess structure for receiving a waveguide material, and depositing the waveguide material onto the substrate and into both the waveguide recess structure and the stress release recess structure.


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