The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 2019

Filed:

Feb. 18, 2015
Applicant:

Sumitomo Metal Mining Co., Ltd., Tokyo, JP;

Inventors:

Toshihiko Nagakura, Niihama, JP;

Yoshitomo Ozaki, Niihama, JP;

Hidemasa Nagai, Niihama, JP;

Tatsuya Higaki, Niihama, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C22B 59/00 (2006.01); C22B 7/00 (2006.01); C22B 3/06 (2006.01);
U.S. Cl.
CPC ...
C22B 7/006 (2013.01); C22B 3/06 (2013.01); C22B 7/00 (2013.01); C22B 59/00 (2013.01); Y02P 10/234 (2015.11);
Abstract

The purpose of the present invention is to recover roughly purified scandium, which is purified to an extent acceptable for a technique for highly purifying scandium, efficiently and without any complicated operation from a neutralization sediment (drainage sediment) generated in neutralizing acid mine drainage which contains a sulfur component. This scandium recovery process includes a washing step (S) for washing a neutralization sediment (drainage sediment) and a dissolution step (S) for subjecting the washed sediment obtained in the washing step (S) to dissolution in an acid. It is preferable that the process further includes a re-dissolution step (S) for subjecting a dissolution residue which remains after the dissolution in the dissolution step (S) to dissolution with an acid. In the washing step (S), the neutralization sediment is washed with a washing liquid until the pH of the post-washing liquid generated in the washing step becomes 6 or higher.


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