The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2019
Filed:
Nov. 06, 2017
Jgc Catalysts and Chemicals Ltd., Kanagawa, JP;
Mitsuaki Kumazawa, Fukuoka, JP;
Miki Egami, Fukuoka, JP;
Hirotada Arakane, Fukuoka, JP;
Ryo Muraguchi, Fukuoka, JP;
Toshiharu Hirai, Fukuoka, JP;
JGC CATALYSTS AND CHEMICALS LTD., Kanagawa, JP;
Abstract
Provided is a silica-based polishing particle which can polish and flatten the surface of a substrate at a sufficient polishing rate with generation of scratches prevented, and successfully prevents generation of particle residues on a substrate after polishing. A silica-based polishing particle with a three-dimensional polycondensation structure containing an alkoxy group, wherein the particle has an average particle diameter (d) of 5 to 300 nm, an aspect ratio of 1.00 or more and 1.20 or less, and a carbon content of 0.005% by mass or more and less than 0.50% by mass.