The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2019
Filed:
Mar. 21, 2017
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Hirotaka Kitagawa, Haibara-gun, JP;
Yuichiro Goto, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 222/10 (2006.01); B41J 2/01 (2006.01); C08F 2/48 (2006.01); B29C 59/02 (2006.01); B29C 59/00 (2006.01); G03F 7/00 (2006.01); H01L 21/027 (2006.01); G03F 7/027 (2006.01); B29K 33/00 (2006.01); B29K 105/00 (2006.01);
U.S. Cl.
CPC ...
C08F 222/10 (2013.01); B29C 59/005 (2013.01); B29C 59/02 (2013.01); B41J 2/01 (2013.01); C08F 2/48 (2013.01); G03F 7/0002 (2013.01); G03F 7/027 (2013.01); H01L 21/0271 (2013.01); B29K 2033/08 (2013.01); B29K 2105/0002 (2013.01); C08F 2222/102 (2013.01); C08F 2222/1013 (2013.01);
Abstract
Provided are a curable composition having excellent releasability and ink jet discharge accuracy, a pattern forming method, a pattern, and a method for manufacturing a device. The curable composition includes a polymerizable compound and a photopolymerization initiator, in which neopentyl glycol diacrylate accounts for 10% by mass or more of the polymerizable compound, and the total content of a compound represented by the following Formula (I) and a compound represented by the following Formula (II) is 5% by mass or less with respect to the content of neopentyl glycol diacrylate.