The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2019
Filed:
Aug. 12, 2015
Rohm and Haas Company, Philadelphia, PA (US);
John David Finch, North Wales, PA (US);
Andrew M. Savo, Cherry Hill, NJ (US);
ROHM AND HAAS COMPANY, Collegeville, PA (US);
Abstract
Provided is a method of forming a polymer, comprising (a) providing a reaction mixture comprising (i) one or more vinyl monomers, (ii) one or more pH-sensitive inhibition systems, (iii) one or more initiators, and (iv) water; (b) establishing conditions in said reaction mixture such that a free radical polymerization of said vinyl monomer occurs at a location, and (c) after steps (a) and (b) and prior to completion of said free radical polymerization, changing the pH of said reaction mixture to increase the rate of generation of said free radical polymerization at the location of said free radical polymerization.