The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2019
Filed:
May. 25, 2017
Evonik Degussa Gmbh, Essen, DE;
Helene Reeker, Dortmund, DE;
Guido Stochniol, Haltern am See, DE;
Dietrich Maschmeyer, Recklinghausen, DE;
Stephan Peitz, Oer-Erkenschwick, DE;
Jörg Schallenberg, Dorsten, DE;
Evonik Degussa GmbH, Essen, DE;
Abstract
The disclosure describes the oligomerization of supercritical ethene. An essential aspect of the invention is that of mixing ethene with an inert medium and setting the conditions in the reaction such that both ethene and the inert medium are supercritical. This is because the solubility for ethene in the inert medium is greater in the supercritical state, such that more ethene is dissolved in the supercritical inert medium than in a liquid solvent. The process regime in the supercritical state therefore enables the use of a much higher proportion of ethene in a homogeneous mixture of ethene and inert medium than is possible on the basis of the thermodynamic solubility restriction in a purely liquid hydrocarbon stream. In this way, the space-time yield is distinctly enhanced. Since a greater amount of ethene can be passed into the reactor, it is possible as a result to better exploit the apparatus volume compared to a liquid phase process. The inert medium used may, for example, be isobutane.