The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 22, 2019

Filed:

Jan. 09, 2018
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Hiroyuki Tomomatsu, Dallas, TX (US);

Hiroshi Yamasaki, Aizuwakamatsu, JP;

Sameer Pendharkar, Allen, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2006.01); H01L 29/20 (2006.01); H01L 29/41 (2006.01); H01L 29/45 (2006.01); H01L 29/49 (2006.01); H01L 27/06 (2006.01); H01L 29/417 (2006.01); H01L 29/778 (2006.01);
U.S. Cl.
CPC ...
H01L 29/404 (2013.01); H01L 27/0605 (2013.01); H01L 29/2003 (2013.01); H01L 29/41758 (2013.01); H01L 29/452 (2013.01); H01L 29/4966 (2013.01); H01L 29/778 (2013.01); H01L 29/7787 (2013.01); H01L 29/402 (2013.01);
Abstract

A transistor device includes a field plate extending from a source contact layer and defining an opening above a gate metal layer. Coplanar with the source contact layer, the field plate is positioned close to the channel region, which helps reduce its parasitic capacitance. Meanwhile, the opening allows a gate runner layer above the field plate to access and connect to the gate metal layer, which helps reduce the resistance of the gate structure. By vertically overlapping the metal gate layer, the field plate, and the gate runner layer, the transistor device may achieve fast switching performance without incurring any size penalty.


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