The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2019
Filed:
Jan. 31, 2014
Applicant:
Tanaka Kikinzoku Kogyo K.k., Tokyo, JP;
Inventors:
Yasuyuki Goto, Tsukuba, JP;
Takamichi Yamamoto, Tsukuba, JP;
Masahiro Nishiura, Tsukuba, JP;
Ryousuke Kushibiki, Tsukuba, JP;
Assignee:
TANAKA KIKINZOKU KOGYO K.K., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); B22F 3/14 (2006.01); C22C 5/04 (2006.01); G11B 5/851 (2006.01); G11B 5/65 (2006.01); C22C 26/00 (2006.01); C22C 32/00 (2006.01); B22F 1/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3429 (2013.01); B22F 1/0059 (2013.01); B22F 3/14 (2013.01); C22C 5/04 (2013.01); C22C 26/00 (2013.01); C22C 32/0084 (2013.01); C23C 14/3414 (2013.01); G11B 5/653 (2013.01); G11B 5/851 (2013.01);
Abstract
An FePt—C-based sputtering target containing Fe, Pt, and C, wherein the FePt—C-based sputtering target has a structure in which primary particles of C that contain unavoidable impurities are dispersed in an FePt-based alloy phase containing 33 at % or more and 60 at % or less of Pt with the balance being Fe and unavoidable impurities, the primary particles of C being dispersed so as not to be in contact with each other.