The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2019
Filed:
Jun. 02, 2017
Apple Inc., Cupertino, CA (US);
Bartosz Ciechanowski, Sunnyvale, CA (US);
Apple Inc., Cupertino, CA (US);
Abstract
Systems, methods, and computer readable media to improve the operation of a computer's display system are described. In general, techniques are disclosed for retaining glyph-mask information for text associated with a region that may be arbitrarily moved across a screen. More particularly, techniques disclosed herein utilize an additional off-screen buffer referred to as the glyph-mask buffer. The glyph-mask buffer coincides with an existing side buffer in extent, but is used only to retain anti-aliased glyph information (i.e., glyph-masks). When the side buffer's content is updated, the effect of that update on the region's text may be reflected in an update to the glyph-mask buffer. At display time, the region corresponding to the side buffer, and the text therein, may be properly rendered at any screen location by combining the screen's target display area (background), the side buffer and the glyph-mask buffer.