The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 22, 2019

Filed:

Mar. 09, 2018
Applicant:

Intermec Technologies Corporation, Fort Mill, SC (US);

Inventors:

Erik Karl Henning Unemyr, Singapore, SG;

Karl Perry, Port Ludlow, WA (US);

Assignee:

INTERMEC TECHNOLOGIES CORPORATION, Fort Mill, SC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 7/14 (2006.01); G06K 19/06 (2006.01); G08G 5/00 (2006.01);
U.S. Cl.
CPC ...
G06K 7/1486 (2013.01); G06K 7/1417 (2013.01); G06K 7/1443 (2013.01); G06K 19/06037 (2013.01); G08G 5/0013 (2013.01); G08G 5/0026 (2013.01); G08G 5/0091 (2013.01); G06K 7/1413 (2013.01); G06K 19/06028 (2013.01);
Abstract

A method for evaluating an output pattern printed on a medium is described. A reference pattern is stored. The output pattern is printed on the medium based correspondingly on the stored reference pattern. A scan based instance of the output pattern is rendered, which has a set of features at least corresponding to the printed output pattern and zero or more features additional thereto. A difference image, having the zero or more features of the rendered scan instance, is computed based on a comparison of the rendered scan instance to the stored reference pattern. Upon the zero or more features including at least one feature, the computed difference image is evaluated in relation to a proximity of at least one feature to locations pixels of the reference pattern.


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