The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2019
Filed:
Feb. 01, 2016
Applicant:
The United States of America As Represented BY the Secretary of the Navy, Washington, DC (US);
Inventors:
Lee Cambrea, Ridgecrest, CA (US);
Zachary Sechrist, Ridgecrest, CA (US);
Assignee:
The United States of America as Represented by the Secretary of the Navy, Washington, DC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); G02B 5/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/008 (2013.01); C23C 16/45525 (2013.01);
Abstract
A selective area atomic layer deposition process that can deposit conductive materials onto one homopolymer region in a diblock copolymer. The diblock copolymer generates a large area self assembled substrate with nanoscale homopolymer regions arrayed into predictable patterns. Combining these two technologies allows formation of plasmonic surfaces without expensive lithographic processing.