The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2019
Filed:
Mar. 30, 2014
Sharp Kabushiki Kaisha, Osaka-shi, JP;
Yuhki Kobayashi, Osaka, JP;
Katsuhiro Kikuchi, Osaka, JP;
Shinichi Kawato, Osaka, JP;
Satoshi Inoue, Osaka, JP;
Takashi Ochi, Osaka, JP;
Eiichi Matsumoto, Mitsuke, JP;
Masahiro Ichihara, Mitsuke, JP;
SHARP KABUSHIKI KAISHA, Sakai, Osaka, JP;
Abstract
A vapor deposition unit () includes a vapor deposition mask (), a vapor deposition source (), and a limiting plate unit (). The limiting plate unit () includes (i) a plurality of first limiting plates () separated from each other in an X axis direction and (ii) a plurality of second limiting plates () disposed directly above the first limiting plates () in a plan view and separated from each other in the X axis direction. At least two second limiting plates () are arranged in the X axis direction for each first limiting plate ().