The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 22, 2019

Filed:

May. 10, 2016
Applicant:

Xerox Corporation, Norwalk, CT (US);

Inventors:

Jorge A. Alvarez, Webster, NY (US);

Michael F. Zona, Webster, NY (US);

William J. Nowak, Webster, NY (US);

Robert A. Clark, Williamson, NY (US);

Chu-heng Liu, Penfield, NY (US);

Paul J. McConville, Webster, NY (US);

Assignee:

Xerox Corporation, Norwalk, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 64/153 (2017.01); G05B 19/4099 (2006.01); B29C 64/165 (2017.01); B29C 64/393 (2017.01); B29C 64/241 (2017.01); B29C 64/314 (2017.01); B29C 64/188 (2017.01); B33Y 30/00 (2015.01);
U.S. Cl.
CPC ...
B29C 64/153 (2017.08); B29C 64/165 (2017.08); B29C 64/188 (2017.08); B29C 64/241 (2017.08); B29C 64/314 (2017.08); B29C 64/393 (2017.08); G05B 19/4099 (2013.01); B33Y 30/00 (2014.12); G05B 2219/35134 (2013.01); G05B 2219/49007 (2013.01);
Abstract

3-D printers include an intermediate transfer surface that transfers a layer of material to a platen each time the platen contacts the intermediate transfer surface to successively form a freestanding stack of layers of the material on the platen. A sensor detects the thickness of the layer on the platen after a fusing station fuses the layer. A feedback loop is electrically connected to the sensor and a development station (that includes a photoreceptor, a charging station providing a static charge to the photoreceptor, a laser device exposing the photoreceptor, and a development device supplying the material to the photoreceptor). The development station adjusts the development bias of the development device, based on a layer thickness measurement from the sensor through the feedback loop, to control the thickness of subsequent ones of the layers transferred from the intermediate transfer surface to the freestanding stack on the platen.


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