The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2019
Filed:
Mar. 03, 2017
Applicant:
The Procter & Gamble Company, Cincinnati, OH (US);
Inventor:
James Anthony Staudigel, Loveland, OH (US);
Assignee:
The Procter and Gamble Company, Cincinnati, OH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07K 16/28 (2006.01); A61K 8/27 (2006.01); A61K 8/02 (2006.01); A61K 8/37 (2006.01); A61K 8/44 (2006.01); A61K 8/46 (2006.01); A61K 8/58 (2006.01); A61K 8/73 (2006.01); A61K 8/81 (2006.01); A61K 8/891 (2006.01); A61Q 5/00 (2006.01); A61Q 5/02 (2006.01); A61Q 5/12 (2006.01); A61K 8/49 (2006.01);
U.S. Cl.
CPC ...
A61K 8/27 (2013.01); A61K 8/0245 (2013.01); A61K 8/0254 (2013.01); A61K 8/37 (2013.01); A61K 8/44 (2013.01); A61K 8/463 (2013.01); A61K 8/4933 (2013.01); A61K 8/58 (2013.01); A61K 8/737 (2013.01); A61K 8/8158 (2013.01); A61K 8/891 (2013.01); A61Q 5/00 (2013.01); A61Q 5/006 (2013.01); A61Q 5/02 (2013.01); A61Q 5/12 (2013.01); A61K 2800/412 (2013.01); A61K 2800/524 (2013.01); A61K 2800/5426 (2013.01); A61K 2800/58 (2013.01); A61K 2800/594 (2013.01); A61K 2800/596 (2013.01); A61K 2800/651 (2013.01);
Abstract
The present invention is directed to a personal care composition is disclosed comprising: a detersive surfactant from about 2% to 50%; an anti-dandruff active; a cationic polymer; a zinc-containing layered material wherein the zinc-containing layered material has a particle size in the range of from about 0.5 um to 4 um; wherein the ratio of silicone deposition to crystalline structurant deposition is greater than about 5.