The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2019
Filed:
Sep. 07, 2017
Nikon Corporation, Tokyo, JP;
Hiroyuki Nagasaka, Kumagaya, JP;
NIKON CORPORATION, Tokyo, JP;
Abstract
An exposure apparatus includes a projection optical system having a last optical element via which an exposure beam is projected to a projection area, and a liquid supply system having a first supply port and a second supply port via which an immersion liquid is supplied to form a liquid immersion area. The first supply port is arranged on one side of the projection area in a scanning direction, and the second supply port is arranged on the other side of the projection area in the scanning direction, the first and second supply ports facing downwardly. A plurality of shot areas of a substrate are successively exposed with the exposure beam through the liquid immersion area covering only a portion of an upper surface of the substrate.