The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2019
Filed:
Aug. 02, 2017
Fujifilm Corporation, Tokyo, JP;
Satoshi Wakamatsu, Kanagawa-ken, JP;
Tadashi Omatsu, Kanagawa-ken, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
The disclosed nanoimprinting method suppresses fluctuations in thickness of residual film and defects due to residual gas in a resist film, onto which a pattern of protrusions and recesses is transferred, in a nanoimprinting method that employs the ink jet method to coat a substrate with droplets of resist material. Droplets are coated onto a substrate such that the spaces between the droplets along an A direction which is substantially parallel to the direction of the lines of a linear pattern of protrusions and recesses are longer than the spaces between the droplets in a B direction which is substantially perpendicular to the A direction, in a nanoimprinting method that coats a substrate with the droplets of a resist material using the ink jet method.