The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2019
Filed:
Oct. 19, 2015
Hitachi, Ltd., Tokyo, JP;
Toru Shirai, Tokyo, JP;
Ryota Satoh, Tokyo, JP;
Yo Taniguchi, Tokyo, JP;
Hisaaki Ochi, Tokyo, JP;
Takenori Murase, Tokyo, JP;
Yoshitaka Bito, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
Provided is a technique in calculating a magnetic susceptibility distribution by using an MRI, for reducing artifacts and noise and improving precision in the magnetic susceptibility distribution being calculated. According to this technique, a magnetic field distribution is obtained via a phase image from a complex image acquired through MRI. Under the constraint based on a relational expression between the magnetic field and the magnetic susceptibility, smoothing process is performed iteratively on the magnetic susceptibility distribution calculated from the magnetic field distribution. Specifically, a minimization process for minimizing through the iterative operation, an error function defined by a predetermined initial magnetic susceptibility distribution and the magnetic field distribution is performed, thereby calculating the magnetic susceptibility distribution. At this time, an updated magnetic susceptibility distribution calculated based on the error function during the minimization process is smoothed, every time the updated magnetic susceptibility distribution is calculated.