The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 15, 2019

Filed:

Sep. 21, 2015
Applicant:

Honeywell International Inc., Morristown, NJ (US);

Inventors:

Johan Backstrom, North Vancouver, CA;

Sarabjit Singh, Andhra Pradesh, IN;

Iouri Markevitch, Vancouver, CA;

Stephane Savard, Vancouver, CA;

Michael Kon Yew Hughes, Vancouver, CA;

Frank Martin Haran, North Vancouver, CA;

Assignee:

Honeywell International Inc., Morris Plains, NJ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01F 23/284 (2006.01); G01F 23/296 (2006.01); G01S 7/292 (2006.01); G01S 7/527 (2006.01); G01S 13/88 (2006.01); G01S 15/88 (2006.01); G01S 7/486 (2006.01);
U.S. Cl.
CPC ...
G01F 23/284 (2013.01); G01F 23/296 (2013.01); G01S 7/292 (2013.01); G01S 7/527 (2013.01); G01S 13/88 (2013.01); G01S 15/88 (2013.01); G01S 7/4866 (2013.01);
Abstract

A method of level finding includes providing characteristics of a shape of a transmitted pulse in time domain launched onto a waveguide into a tank having at least one material therein, physical properties of the waveguide and real and imaginary dielectric characteristics of the material at a frequency of the pulse. A level finding algorithm having a coarse search and a fine search is implemented, where the coarse search minimizes a prediction error between an echo signal (echo curve y(k)) and a sampled pulse model echo p(k) to obtain an objective function J(k) in a vicinity of a minimum prediction error (k*). The fine search calculates at least one minimum or maximum using J(k) in the vicinity of k*. The minimum or the maximum corresponds to a level of the material or an interface involving the material.


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