The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2019
Filed:
Mar. 10, 2014
Applicant:
Rutgers, the State University of New Jersey, New Brunswick, NJ (US);
Inventors:
Glenn G. Amatucci, Peapack, NJ (US);
Anthony Ferrer, North Brunswick, NJ (US);
Assignee:
Rutgers, The State University of New Jersey, New Brunswick, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/00 (2014.01); B23K 26/08 (2014.01); C23F 4/02 (2006.01);
U.S. Cl.
CPC ...
C23F 4/02 (2013.01);
Abstract
The described invention provides a method of patterning a thin film deposited on a substrate comprising applying a moving focused field of thermal energy to the thin film deposited on the substrate; and dewetting the thin film from the substrate. Dewetting the thin film from the substrate is characterized by a negative space of a desired design; and displacement of the thin film into adjacent structures, thereby accumulating thin film in the adjacent structures.