The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10179737 B1

PDF
Full Text
Expired
Date of Patent:
Jan. 15, 2019

Filed:

Jun. 16, 2016
Applicant:

Jnc Corporation, Tokyo, JP;

Inventors:

Tetsuro Kizaki, Chiba, JP;

Keizo Iwatani, Chiba, JP;

Assignee:

JNC CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 3/02 (2006.01); C09K 3/14 (2006.01); C01B 31/30 (2006.01); C03C 1/00 (2006.01); C03C 3/04 (2006.01); C03C 12/00 (2006.01); C08G 77/06 (2006.01); C04B 35/56 (2006.01); C04B 35/65 (2006.01); C10M 103/02 (2006.01); C01B 32/907 (2017.01); B24D 3/00 (2006.01); B24D 11/00 (2006.01); B24D 18/00 (2006.01);
U.S. Cl.
CPC ...
C01B 31/301 (2013.01); C01B 32/907 (2017.08); C03C 1/006 (2013.01); C03C 3/045 (2013.01); C03C 12/00 (2013.01); C04B 35/5603 (2013.01); C04B 35/65 (2013.01); C08G 77/06 (2013.01); C09K 3/1418 (2013.01); C10M 103/02 (2013.01); C01P 2004/32 (2013.01); C01P 2004/60 (2013.01); C01P 2004/61 (2013.01); C01P 2004/62 (2013.01); C04B 2235/3895 (2013.01); C04B 2235/483 (2013.01); C10M 2201/10 (2013.01); C10N 2230/06 (2013.01); C10N 2250/08 (2013.01);
Abstract

Provided are spherical silicon oxycarbide particle material and manufacturing method thereof, wherein the average particle size is in the range of 0.1-100 μm and having a sphericity of 0.95-1.0. Spherical silicon oxycarbide particle material and manufacturing method thereof are provided as follows. Organotrialkoxysilane is hydrolyzed in a pH 3-6 acetic acid aqueous solution, thereafter an alkaline aqueous solution such as a pH 7-12 ammonia water was added to the obtained hydrolysate. The condensation reaction is performed in an alkaline range to form spherical polysilsesquioxane particles that are spherical silicon oxycarbide precursors that has no melting point or softening point. Sintering was then performed at a sintering temperature of 600-1400° C. under inert atmosphere to obtain spherical silicon oxycarbide particle material.


Find Patent Forward Citations

Kizaki, Tetsuro. (2019). Spherical silicon oxycarbide particle material and manufacturing method thereof (U.S. Patent No. 10179737). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10179737

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