The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 15, 2019

Filed:

Jul. 09, 2015
Applicant:

Emx, International Llc, Melbourne, FL (US);

Inventor:

Daniel Graybeal, Melbourne, FL (US);

Assignee:

EMX Advanced Technologies, LLC, Melbourne, FL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81B 3/00 (2006.01); G01J 5/40 (2006.01);
U.S. Cl.
CPC ...
B81B 3/0024 (2013.01); G01J 5/40 (2013.01);
Abstract

In some aspects, the present invention embodies both the method and apparatus for converting a pattern of irradiation to a visible image. An embodiment of the present invention provides an array of micro-electro-mechanical sensors with each sensor includes a deflectable micro-cantilever, responsive to absorbed incident radiation and to an applied repulsive electrostatic field. Associated circuitry senses a change in an output signal of the sensor as it responds to incident radiation incident upon the cantilever and provides a biasing force to deflect the cantilever and maintain the detector output signal at a desirable level. The biasing element may be a piezoelectric element, a heater or a pair of electrodes and the corresponding biasing stimulus may be stress (expansion), heat, or electrostatic change. The stimulus compensates for the effect of the infrared radiation and maintains the chosen detector output level at the same level.


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