The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 15, 2019

Filed:

May. 23, 2016
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Balasubramanian Ramachandran, Santa Clara, CA (US);

Masato Ishii, Sunnyvale, CA (US);

Aaron Muir Hunter, Santa Cruz, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B08B 9/46 (2006.01); H01L 21/67 (2006.01); C23C 16/44 (2006.01); C23C 16/52 (2006.01); B08B 3/08 (2006.01); B08B 3/10 (2006.01); G01N 21/94 (2006.01); G01N 21/84 (2006.01);
U.S. Cl.
CPC ...
B08B 9/46 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); C23C 16/4405 (2013.01); C23C 16/52 (2013.01); G01N 21/94 (2013.01); H01L 21/67253 (2013.01); G01N 2021/8416 (2013.01);
Abstract

Methods and apparatus for determining an endpoint of a process chamber cleaning process are provided. In some embodiments, a method of monitoring a process being performed in a process chamber includes: performing a cleaning process in a process chamber to remove material deposited on one or more internal surfaces of the process chamber resultant from processes performed within the process chamber; shining a light on a first internal surface being cleaned; detecting the light reflected off of the first internal surface; and terminating the cleaning process based upon the detected light.


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