The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 15, 2019

Filed:

Mar. 06, 2014
Applicant:

Taica Corporation, Tokyo, JP;

Inventors:

Wataru Ikeda, Tokyo, JP;

Akiko Tomiki, Tokyo, JP;

Assignee:

TAICA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 1/08 (2006.01); B05C 11/11 (2006.01); B41F 7/32 (2006.01); B44C 1/175 (2006.01); B05C 3/10 (2006.01); B41F 31/02 (2006.01);
U.S. Cl.
CPC ...
B05C 1/0817 (2013.01); B05C 1/083 (2013.01); B05C 1/0813 (2013.01); B05C 3/10 (2013.01); B05C 11/11 (2013.01); B41F 7/32 (2013.01); B44C 1/175 (2013.01); B41F 31/022 (2013.01);
Abstract

Activator applying device including a receiving pan that stores an activator for activation of a transfer film, and a spreading roller that rotates while being dipped in the activator in the receiving pan and applies the activator that has adhered to the surface thereof in a dip section of the activator applying device to the transfer pattern in a different section of the activator applying device. The activator is fed to the receiving pan in an amount greater than the amount of the activator applied to the transfer pattern, and an excessive activator is discharged through a discharge port of the receiving pan. The activator is applied to the transfer pattern with the discharge port being located on the side where the activator is drawn up from the dip section, and the discharge port being located at the position of a streak caused by uneven dispersion of the additive pigment.


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