The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2019

Filed:

Aug. 22, 2017
Applicants:

Vladan Jankovic, Los Angeles, CA (US);

Jennifer Dionne, Menlo Park, CA (US);

Brian Keith Baum, Portland, OR (US);

Hadiseh Alaeian, Evanston, IL (US);

Mark Lawrence, San Fransico, CA (US);

Inventors:

Vladan Jankovic, Los Angeles, CA (US);

Jennifer Dionne, Menlo Park, CA (US);

Brian Keith Baum, Portland, OR (US);

Hadiseh Alaeian, Evanston, IL (US);

Mark Lawrence, San Fransico, CA (US);

Assignee:

Northrop Grumman Systems Corporation, Falls Church, VA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 1/62 (2006.01); H05B 33/14 (2006.01); C01G 31/02 (2006.01); C01B 19/00 (2006.01); C01G 17/00 (2006.01); H01P 1/20 (2006.01); C01B 33/113 (2006.01); C01G 7/00 (2006.01); C01G 15/00 (2006.01); G02F 1/313 (2006.01);
U.S. Cl.
CPC ...
H05B 33/145 (2013.01); C01B 19/007 (2013.01); C01G 17/00 (2013.01); C01G 31/02 (2013.01); H01P 1/2002 (2013.01); C01B 33/113 (2013.01); C01G 7/00 (2013.01); C01G 15/006 (2013.01); C01P 2004/64 (2013.01); G02F 1/313 (2013.01);
Abstract

A device includes a light adjustment apparatus having a first material and a second material. The first material includes a first real dielectric permittivity and a positive imaginary dielectric permittivity. The second material includes a second real dielectric permittivity and a negative imaginary dielectric permittivity. The first and second materials affect the flow of light. The light adjustment apparatus includes a tunable material to enable adjustment of the dielectric permittivity of the respective materials.


Find Patent Forward Citations

Loading…