The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 2019

Filed:

Mar. 12, 2018
Applicant:

SK Hynix Inc., Icheon-si, Gyeonggi-do, KR;

Inventors:

Hae Chan Park, Cheongju-si, KR;

Jae Taek Kim, Seoul, KR;

Assignee:

SK hynix Inc., Icheon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 23/528 (2006.01); H01L 27/24 (2006.01); H01L 27/11582 (2017.01); H01L 27/11556 (2017.01);
U.S. Cl.
CPC ...
H01L 29/0649 (2013.01); H01L 23/528 (2013.01); H01L 27/11556 (2013.01); H01L 27/11582 (2013.01); H01L 27/2481 (2013.01);
Abstract

A semiconductor device includes a stack structure located on a substrate and includes a first region, in which sacrificial layers and insulating layers are alternately stacked, and a second region, in which conductive layers and insulating layers are alternately stacked. The stack structure also includes a first slit insulating layer located at a boundary between the first region and the second region, wherein the first slit insulating layer penetrates the stack structure and extends in one direction. The stack structure further includes a plurality of slit insulating patterns located in the second region, wherein the plurality of slit insulating patterns penetrate the stack structure and are arranged along the one direction. At least one conductive layer among the conductive layers is bent between the first slit insulating layer and the slit insulating patterns.


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